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ETH Zürich - D-PHYS - Solid State Physics - Microstructure Research - Instrumentation - Structure fabrication

Structure fabrication

Selected Article

Nat. Comm 7, 13611 (2016)
Critical exponents and scaling invariance in the absence of a critical point

Proc. R. Soc. A 472, 2195 (2016)
Thirty per cent contrast in secondary-electron imaging by scanning field-emission microscopy
Phys. Rev. B 89, 014429 (2014)
Domain-wall free energy in Heisenberg ferromagnets

Phys. Rev. B 87, 115436 (2013)
Scale invariance of a diodelike tunnel junction
Fabrication of Micro- and Nanostructures
Our scope is to produce extremely small, single crystalline magnetic structures with reproducible magnetic properties and with a thickness of a few atomic layers. Teh shape and the lateral arrangement of these small magnets must be well defined. This task is achieved by in situ fabrication with molecular beam epitaxial growth through a diaphragm. In order to grow extremely small structures having sharp boundaries, the diaphragm has to be positioned and aligned very close to the sample surface. Accurate positioning of the diaphragm is controlled by a piezo inertial slider with a minimum step size of about 100nm. The structure mask is a 1 m m thick titanium foil with microholes. A commercial focused ion beam (FIB) system is used to etch the mask. With this combination of MBE and diaphragm technique we are able to fabricate clean and atomically thin particles, control their number, size and shape at will.
Diaphragms can be exchanged in situ and are cleaned like a sample surface through circles of Argon ion sputtering and mild heating. This reduces contamination of the sample during growth to a minimum. Evaporation source and diaphragm are 300 mm apart. This together with the ability to place the diaphragm extremely close to the sample surface reduces boundary effects which occur due to the non point like character of the material source. The left side of the figure shows a STM cross section through a 500 nm wide Co stripe. On the right side the electron yield of a SEM linescan over the edge of a structure is displayed.
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